TETRAKIS(DIETHYLAMINO)ZIRCONIUM

TETRAKIS(DIETHYLAMINO)ZIRCONIUM
  • CAS No.:13801-49-5
Other grades of this product :
TETRAKIS(DIETHYLAMINO)ZIRCONIUM Basic information
Description Reference
Product Name:TETRAKIS(DIETHYLAMINO)ZIRCONIUM
Synonyms:Tetrakis(diethylaMino)zirconiuM(IV), 99%;Zirconium, tetrakis(diethylamino)-;TETRAKIS(DIETHYLAMIDO)ZIRCONIUM(IV), ELECTRONIC GRADE, 99.99+%;Tetrakis(diethylamino)zirkonium;Tetrakis(diethylamino)zirconium,99%;tetrakis(diethylamido)zirconium(iv);TETRAKIS(DIETHYLAMINO)ZIRCONIUM;ZIRCONIUM DIETHYLAMIDE
CAS:13801-49-5
MF:C4H11NZr
MW:164.36
EINECS:
Product Categories:Precursors by Metal;metal amide complex;Vapor Deposition Precursors;Zirconium
Mol File:13801-49-5.mol
TETRAKIS(DIETHYLAMINO)ZIRCONIUM Chemical Properties
Boiling point 128 °C/0.05 mmHg (lit.)
density 1.026 g/mL at 25 °C (lit.)
refractive index n20/D 1.51(lit.)
Fp 54 °F
storage temp. 2-8°C
form liquid
color yellow
Sensitive Moisture Sensitive
Safety Information
Hazard Codes F,Xi
Risk Statements 11-14-36/37/38
Safety Statements 16-26-36
RIDADR UN 3398 4.3/PG 2
WGK Germany 3
HazardClass 4.3
PackingGroup II
MSDS Information
ProviderLanguage
ACROS English
SigmaAldrich English
ALFA English
TETRAKIS(DIETHYLAMINO)ZIRCONIUM Usage And Synthesis
DescriptionTetrakis (diethylamino) zirconium is a useful precusor compound in the deposition of thin film ferroelectric materials by CVD. It is also useful in the production of olefin polymers1,2. As a precusor, it is also useful in the deposition of ZrN films using remote plasma-enhanced atomic layer deposition method3.
Reference
  1. Greenwald, Anton C. "CVD thin film compounds." US, US5104690. 1992.
  2. Murray, Rex Eugene. "Catalyst for the production of olefin polymers." US, US 6320005 B1. 2001.
  3. Cho, Seungchan, et al. "Barrier Characteristics of ZrN Films Deposited by Remote Plasma-Enhanced Atomic Layer Deposition Using Tetrakis (diethylamino) zirconium Precursor." Japanese Journal of Applied Physics 46. 7A (2007):4085-4088.
UsesTetrakis(diethylamino)zirconium is used in the preparation of ZrN and ZrO2 films as well as zirconium complexes to act as catalytic precursors for organic chemical reactions.
General DescriptionAtomic number of base material: 40 Zirconium
TETRAKIS(DIETHYLAMINO)ZIRCONIUM Preparation Products And Raw materials

Welcome!

Please leave a message for us or use the following ways to contact us, we will reply to you as soon as possible, and provide you with the most sincere service, thank you.

  • NO. 18 ,Wujiang Road, Wulidian Street, Jiangbei District, Chongqing
  • +86-23-6139-8061 +86-13650506873
  • danny@chemdad.com sales@chemdad.com
  • www.chemdad.com
  • WhatsApp +86-13650506873

Name

phone

company

email

message

Payment methods
Google translate: 日本语日本语 한국어한국어 FrançaisFrançais DeutschDeutsch EspañaEspaña TürkiyeTürkiye