| TRI-T-BUTOXYSILANOL Basic information |
| Uses |
| Product Name: | TRI-T-BUTOXYSILANOL |
| Synonyms: | TRI-T-BUTOXYSILANOL;TRIS(TERT-BUTOXY)SILANOL;TRIS(T-BUTOXY)SILANOL;Tri-tert-butoxysilanol;Tri-t-butoxysilanol (99.9+%-Si);Tri-t-butoxysilanol (99.999%-Si) PURATREM 14-7015 contained in 50 ml Swagelok(R) cylinder (96-1077) for CVD/ALD;hydroxy-tris[(2-methylpropan-2-yl)oxy]silane;Tri-t-butoxysilanol PURATREM 14-7015 contained in 50 Ml Swagelokcylinder (96-1077) for CVD/ALD |
| CAS: | 18166-43-3 |
| MF: | C12H28O4Si |
| MW: | 264.43 |
| EINECS: | |
| Product Categories: | Micro/Nanoelectronics;Organosilicon;Precursors by Metal;Precursors Packaged for Deposition SystemsOrganometallic Reagents;SilanolsVapor Deposition Precursors;Vapor Deposition Precursors;14: Silicon;Chemical Synthesis;CVD and ALD Precursors by Metal;CVD and ALD Precursors Packaged for Deposition Systems;Materials Science;Organometallic Reagents;Silanols;Silicon;Silanes;Solution Deposition Precursors;Vapor Deposition Precursors |
| Mol File: | 18166-43-3.mol |
| TRI-T-BUTOXYSILANOL Chemical Properties |
| Melting point | 63-65 °C(lit.) |
| Boiling point | 205-210 °C(lit.) |
| density | 0,92 g/cm3 |
| Fp | >65°C |
| storage temp. | Inert atmosphere,Room Temperature |
| form | solid |
| pka | 11.78±0.53(Predicted) |
| Hydrolytic Sensitivity | 7: reacts slowly with moisture/water |
| Sensitive | moisture sensitive |
| MSDS Information |
| Provider | Language |
|---|---|
| SigmaAldrich | English |
| TRI-T-BUTOXYSILANOL Usage And Synthesis |
| Uses | Silicon oxide source for rapid atomic layer deposition to prepare various nanolaminates. |
| Uses | Precursors Packaged for Depositions Systems |
| Uses | Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates. |
| General Description | Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica. |
| TRI-T-BUTOXYSILANOL Preparation Products And Raw materials |
| Raw materials | Di-tert-butoxydichlorosilane.-->TRI-T-BUTOXYCHLOROSILANE-->Water-->Sodium tert-butoxide-->tert-Butanol-->Isobutylene |
| Preparation Products | Tetrahydrofuran |
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