POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE)

POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE)
  • CAS No.:25608-33-7
Other grades of this product :
POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE) Basic information
Product Name:POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE)
Synonyms:2-Propenoicacid,2-methyl-,butylester,polymerwithmethyl2-methyl-2-propenoate;Butylmethacrylate,methylmethacrylatepolymer;POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE);EUKITT(R) QUICK-HARDENING MOUNTING ME-DI UM, F. MICROSCOPY;POLY(BUTYL METHACRYLATE-CO-METYL METH-AC RYLATE);POLY(BUTYL METHACRYLATE-CO-METHYL METH-&;eukitt quick-hardening mounting medium;n-butyl methacrylate/ methyl methacrylate copolymer
CAS:25608-33-7
MF:C13H22O4
MW:242.32
EINECS:
Product Categories:Acrylics;Hydrophobic Polymers;Methacrylate PolymersSelf Assembly&Contact Printing;PMMA-Based Resins;Stamps for Nanoprint Lithography&Microcontact Printing;Contact Printing;Hydrophobic Polymers;Materials Science;Methacrylate Polymers;Micro/NanoElectronics;Microcontact Printing;PMMA-Based Resins;Polymer Science;Self Assembly &Polymers;Stamps for Nanoprint Lithography &amp
Mol File:25608-33-7.mol
POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE) Chemical Properties
density 1.15 g/mL at 25 °C(lit.)
Fp 23 °C
storage temp. room temp
solubility alcohols and aliphatic hydrocarbons: insoluble
EPA Substance Registry SystemButyl methacrylate methyl methacrylate polymer (25608-33-7)
Safety Information
Hazard Codes Xn
Risk Statements 10-20/21-38
Safety Statements 25-36/37
RIDADR UN 1307 3/PG 3
WGK Germany 3
MSDS Information
ProviderLanguage
SigmaAldrich English
POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE) Usage And Synthesis
UsesPigment-wetting binder for coatings on plastics.
UsesBinding agent for printing inks and foil, hardboard and ceramic lacquers.
UsesPoly(butyl methacrylate-co-methyl methacrylate) (P(BMA-co-MMA) ) may be used to synthesize porous interpenetrating polymer network (IPN) with low-density polymers. These IPN structures are applicable as membranes for separation of liquid mixtures due to their high mechanical strength and selectivity. P(BMA-co-MMA) particles may be used to encapsulate single non-aggregated semiconducting quantum dots (QDs) for size enlargement.These hybrid organic/inorganic nanostructures may be used as single photon sources.
POLY(METHYL METHACRYLATE-CO-BUTYL METHACRYLATE) Preparation Products And Raw materials

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