| TETRAKIS(TRIMETHYLSILOXY)SILANE Basic information |
| Product Name: | TETRAKIS(TRIMETHYLSILOXY)SILANE |
| Synonyms: | 1,1,1,5,5,5-hexamethyl-3,3-bis-(trimethylsilanyloxy)-trisiloxane;1,1,1,5,5,5-hexamethyl-3,3-bis(trimethylsiloxy)-Trisiloxane;1,1,1,5,5,5-hexamethyl-3,3-bis[(trimethylsilyl)oxy]-trisiloxan;1,1,1,5,5,5-hexamethyl-3,3-bis[(trimethylsilyl)oxy]-Trisiloxane;1,1,1,5,5,5-hexamethyl-3,3-bis-trimethylsilanyloxy-trisiloxane;1,1,5,5,5-hexamethyl-3,3-bis[(trimethylsilyl)oxy]trisiloxane;Tetrakis-(trimethylsilyloxy)-silan;Trisiloxane,1,1,1,5,5,5-hexamethyl-3,3-bis[(trimethylsilyl)oxy]- |
| CAS: | 3555-47-3 |
| MF: | C12H36O4Si5 |
| MW: | 384.84 |
| EINECS: | 222-613-4 |
| Product Categories: | Organics;OthersOrganometallic Reagents;Organometallic Reagents;Organosilicon;Trialkoxysilanes |
| Mol File: | 3555-47-3.mol |
| TETRAKIS(TRIMETHYLSILOXY)SILANE Chemical Properties |
| Melting point | -60 °C |
| Boiling point | 103-106 °C/2 mmHg (lit.) |
| density | 0.87 g/mL at 25 °C (lit.) |
| vapor pressure | 27.4hPa at 20℃ |
| refractive index | n |
| Fp | 169 °F |
| storage temp. | Inert atmosphere,Room Temperature |
| form | liquid |
| Specific Gravity | 0.868 |
| color | Colorless to Almost colorless |
| Water Solubility | 150.7ng/L at 23℃ |
| Hydrolytic Sensitivity | 4: no reaction with water under neutral conditions |
| BRN | 1793898 |
| LogP | 9 at 25℃ |
| EPA Substance Registry System | Tetrakis(trimethylsiloxy)silane (3555-47-3) |
| Safety Information |
| Hazard Codes | Xi |
| Risk Statements | 36/37/38 |
| Safety Statements | 26-36 |
| WGK Germany | 3 |
| TSCA | Yes |
| HS Code | 29319090 |
| MSDS Information |
| Provider | Language |
|---|---|
| SigmaAldrich | English |
| ACROS | English |
| ALFA | English |
| TETRAKIS(TRIMETHYLSILOXY)SILANE Usage And Synthesis |
| Chemical Properties | Colorless liquid |
| Uses | Tetrakis(trimethylsilyloxy)silane (TTMS) is an organosilicon compound used as a precursor to prepare nanostructured organosilicon polymer films by plasma-enhanced chemical vapor deposition (PECVD) at atmospheric pressure. TTMS along with cyclohexane can also be used to synthesize low dielectric constant SiCOH films by PECVD method. |
| Flammability and Explosibility | Notclassified |
| TETRAKIS(TRIMETHYLSILOXY)SILANE Preparation Products And Raw materials |
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